ZEIT Atomic Layer Deposition Equipment

ZEIT Atomic Layer Deposition Equipment

ALD

March 16, 2023

Category Connection: Atomic Layer Deposition Equipment

ZEIT Atomic layer deposition (ALD) is a method of depositing the substances on the surface of substrate in the form of single atomic film layer by layer. Atomic layer deposition is similar to common chemical deposition, but in the process of atomic layer deposition, the chemical reaction of a new layer of atomic film is directly associated with the previous layer, so that only one layer of atoms is deposited in each reaction by this method.

Atomic Layer Deposition is widely used in Micro-electromechanical Systems devices, electroluminescent displays, storage materials, inductive coupling, crystalline silicon solar battery, perovskite thin-film battery, 3D packaging, luminous application, sensors, medical treatment, corrosion protection layer, Fuel battery, lithium battery, hard disk read/write heads, decorative coating, anti-discoloration coating, optical films, etc. Customized production available.

Tel: 86-28-62156220-810
Phone: +86 137 3067 2621 / +86 180 0059 9572
Whatsapp: +852 5982 6533
Email: hua.du@zeit-group.com
Web: www.optics-equipment.com

Tags:

#Nanostructure Atomic Layer Deposition #Filtration ald machine #Micro Electro Mechanical Systems ALD