Wafer Structural Light Surface Shape Detection Equipment
Applications
Wafer flatness detection.
Working Principle
The point cloud distribution and curvature distribution of the measured surface are calculated according to the
deformation of the light stripe, and the surface shape error distribution can be obtained by comparing the point
cloud distribution with ideal model.
Features
| Model | SSD-W-X—X |
| Measuring range | 200×150mm2 |
| Transverse resolution | Conventional 0.25mm, adjustable |
| Measuring precision | Absolute error: ±3μm (100mm in diameter) |
| Note: Customized production available. | |
Detection Image
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