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Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry

Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry

  • High Light

    Perovskite Thin-film Battery Magnetron Sputtering Deposition

    ,

    Perovskite Thin-film Battery magnetron sputter coater

    ,

    dielectric films magnetron sputter coater

  • Weight
    2500±200KG, Customizable
  • Size
    2800*1000*2300mm, Customizable
  • Customizable
    Available
  • Guarantee Period
    1 Year Or Case By Case
  • Shipping Terms
    By Sea / Air / Multimodal Transport
  • Place of Origin
    Chengdu, P.R.CHINA
  • Brand Name
    ZEIT
  • Certification
    Case by case
  • Model Number
    MSC-PFB-X—X
  • Minimum Order Quantity
    1set
  • Price
    Case by case
  • Packaging Details
    Wooden case
  • Delivery Time
    Case by case
  • Payment Terms
    T/T
  • Supply Ability
    Case by case

Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry

Magnetron Sputtering Deposition in Perovskite Thin-film Battery Industry
 
 
Applications

  Applications   Specific Purpose   Material Type
  Perovskite thin-film battery   Transparent conducting layer   ZnO:Al

 
Working Principle
Magnetron sputtering is to constrain and extend the motion paths of electron by magnetic field, change the motion
directions of electron, increase the ionization rate of working gas and effectively use the energy of electrons.
Magnetron sputtering has the following characteristics: rapid deposition rate, high deposition efficiency, suitable for
large-scale application in industrial production; low substrate temperature, suitable for the coating of plastics and
other heat resisting substrates; high purity of the prepared films, good compactness, better film uniformity and strong
film-substrate cohesion; metal, alloy, oxide and other films can be prepared; pollution-free.
 
Features

  Model   MSC-PFB-X—X
  Coating type   Various dielectric films such as metal film, metal oxide and AIN
  Coating temperature range   Normal temperature to 500℃
  Coating vacuum chamber size   700mm*750mm*700mm (Customizable)
  Background vacuum   < 5×10-7mbar
  Coating thickness   ≥ 10nm
  Thickness control precision

  ≤ ±3%

  Maximum coating size   ≥ 100mm (Customizable)
  Film thickness uniformity   ≤ ±0.5%
  Substrate carrier   With planetary rotation mechanism
  Target material   4×4 inches(compatible with 4 inches and below)
  Power supply   The power supplies such as DC, pulse, RF, IF and bias are optional
  Process gas

  Ar, N2, O2

  Note: Customized production available.

                                                                                                                
Coating Sample

Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry 0

 

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Roughly vacuumize;
→ Turn on molecular pump, vacuumize at top speed, then turn on the revolution and rotation;
→ Heating the vacuum chamber until the temperature reaches the target;
→ Implement the constant temperature control;
→ Clean elements;
→ Revolve and back to the origin;
→ Coating film according to process requirements;
→ Lower temperature and stop the pump assembly after coating;
→ Stop working when the automatic operation is finished.
 
Our Advantages
We are manufacturer.
Mature process.
Reply within 24 working hours.
 
Our ISO Certification
Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry 1
 
Parts Of Our Patents
Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry 2Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry 3
 
Parts Of Our Awards and Qualifications of R&D

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