Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

Dielectric Films Optical Coating Equipment Ar N2 O2 PVD Magnetron Sputtering Deposition

Applications

Features

Process Steps

→ Place the substrate for coating into the vacuum chamber;

→ Roughly vacuumize;

→ Turn on molecular pump, vacuumize at top speed, then turn on the revolution and rotation;

→ Heating the vacuum chamber until the temperature reaches the target;

→ Implement the constant temperature control;

→ Clean elements;

→ Revolve and back to the origin;

→ Coating film according to process requirements;

→ Lower temperature and stop the pump assembly after coating;

→ Stop working when the automatic operation is finished.

Coating Sample

Working Principle

Magnetron sputtering is a kind of Physical Vapor Deposition (PVD). It makes the electrons move in spiral

paths near the target surface by the interaction between magnetic and electric fields, thus increasing the

probability of electrons hitting argon gas to generate ions.The generated ions then hit the target surface

under the action of electric field and sputter the target materials to deposite thin film on the substrate surface.

The general sputtering method can be used for preparation of various metals, semiconductors, ferromagnetic

materials, as well as insulated oxides, ceramics and other substances. The equipment uses PLC+ touch

panel HMI control system, which can enter parameters by programmable process interface, with the functions

such as single target sputtering, multi-target sequential sputtering and co-sputtering.

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• Global technical support experts to manage product escalations and solve issues quickly.
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• Refurbish and repair programs locally to lower your cost of ownership and decrease turn around times.
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Comprehensive Coverage by Best-in-Class Field Service Engineers

• Performance guarantee programs such as guaranteed cost or uptime.
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