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The Groundbreaking Ceremony of ZEIT Photomask Substrate Pilot Plant Construction Project

June 28, 2022

The groundbreaking ceremony of ZEIT high-end photomask substrate pilot plant construction project was held in Chengdu screen and core intelligent manufacturing base on June 21, 2022. Dr. Yang Wei (chairman of ZEIT), executives and some invited guests attended this ceremony.

 

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The pilot plant covers an area of 8000m2, and involves high-grade ultra-clean rooms,vibration isolation foundation, etc. After completion, ZEIT can realize the localization of high-end quartz mask substrate and the autonomous controllable industrialization of core equipment. The plant ’s estimated annual output value is more than 15 million dollars. It will become the sole domestic high-end quartz mask substrate manufacturer with core equipments and pure domestic production lines, which fill a gap in the research and application fields of high-end quartz mask substrate.

 

Dr. Yang made a speech at this ceremony: Firstly, he thanked governments for their investment supports. Secondly, he thanked the staff for their unremitting efforts and technical breakthroughs in the core equipments and advanced process. Finally, he thanked angel investors for their trust. ZEIT will become the domestic advanced, international first-class, and industry-university-research integrated high-end core and screen quartz mask substrate production base.

 

Adhering to the business philosophy of " Pursuing Excellence without Limits ", ZEIT continues to offer precision optics, semiconductor customers and others with better products and services, such as high-definition display, integrated circuit and aerospace, etc.