ZEIT coating technology center has undertaken the Suzhou PECVD process development project. After half a month of process development and technological breakthrough, ZEIT completed the PECVD process of SiNx and SiO2 films, reached the indexes of surface uniformity and each layer uniformity.
Through this project, ZEIT has formed own characteristics in the core technologies of PECVD equipment, such as RF matching, rapid and stable reaction pressure, uniform distribution of airflow, and also has proposed solutions for dust pollution, patterned film surface, chamber self-cleaning, etc. Arising from that, ZEIT has accumulated a lot of experience of PECVD equipment optimization and technological adjustment, which has laid a solid foundation for import substitution, industrialization, and continuous customer relations.
